Plasma Cleaner
PV4
Plasma cleaner could be used to produce highly active plasma for substrate cleaning, elecment doping, polarity changing and wafer etching, which was commonly used in semiconductor, display, photovoltaics, and chip industries.
Plasma was produced by using high voltage circuits to provide highly active electrons which will collide with gas moleculars under vacuum. The plasma is very active, which could react with the organic residues, or attach functional groups containing oxygen on substrate surfaces. The following figure showed the basic mechanism.
Our PV4 product has a chamber of 4L. All the setup was controlled by a 7 inch touch screen, including power, time, vacuum etc. It is user friendly, safe and easy to control, fitting well for R&D in academias and industries.
Custom feedbacks：
Cleaning ITO and PET substrates by PV4 in air plasma, the contact angel was largely changed, from 81 and 76 degree respectively, to 9 and 15 degree. The hydrofilic results was obtained. The contact angles could be custmized by different power and time setups according to different needs.
